Interconnect Structure And A Method Of Fabricating The Same

ABSTRACT

An interconnect structure, an interconnect structure for interconnecting first and second components, an interconnect structure for interconnecting a multiple component stack and a substrate, and a method of fabricating an interconnect structure. The interconnect structure comprising a base portion formed on a mounting surface of a first component; a pillar portion extending from the base portion and substantially perpendicularly to the mounting surface; and a head portion formed on the pillar portion and having larger lateral dimensions than the pillar portion; wherein the base portion and the pillar portion are integrally formed of a homogeneous material.

FIELD OF INVENTION

The present invention relates broadly to an interconnect structure, toan interconnect structure for interconnecting first and secondcomponents, to an interconnect structure for interconnecting a multiplecomponent stack and a substrate, and to a method of fabricating aninterconnect structure.

BACKGROUND

Bonded wires, solder bumps and metal pillars are common microstructuresformed on micro devices which are usually fabricated on silicon wafers.Wire bonding is the earliest technique for interconnecting electronicdevices. Thermosonic wire bonding is a commonly used technique.Conventional wire bonding allows Input/Output (I/O) pad bonding only ona chip perimeter near edges of a chip. Low profile and flexible longloop wire can be bonded across multiple chips and substrates. However,the trade-off in long wire interconnection is its high impedance andparasitic inductance and capacitance. Wire bonding is usually notsuitable for high frequency and RF applications. Further, wire bondingover an active portion of a silicon chip may damage the delicatecircuitry beneath it. This restriction limits the design for optimalpower distribution and chip size shrinkage.

Flip-chip technology is an important development for the microelectronicindustry. An optimized flip-chip device provides improvement in cost,reliability and performance over a wire-bonded device. The flip-chipdevice also has better electrical performance and lower impedance,inductance and capacitance. Aided by a self-alignment characteristic ofsolder, flip-chip packaging using solder bump has excellent yield. Anarea array interconnection format on flip-chip allows large number ofI/Os to be distributed across the chip surface. This improves pitchspacing and power distribution. With no additional packaging materialover the bare chip, the flip-chip has the smallest possible size. As theflip-chip array pitch decreases, the interconnect solder bump diameteron the flip-chip may decrease correspondingly.

One disadvantage for reducing a solder bump size is the increase in thevolume ratio of the IMC to bulk solder in an interconnecting joint. Ahigher percentage of the IMC in the solder joint is undesirable as theIMC is brittle and the fatigue life of the solder joint can be reduced.Another disadvantage is the increase in current density as the solderbump size decreases. As current density increases, electromigration willbecome a reliability concern in package interconnection.

FIG. 1 shows a schematic drawing of a typical solder bumpinterconnection 100. The typical solder bump interconnection 100comprises an under-bump-metallization (UBM) 102, a solder bump 104 and amatching substrate bond pad 106. However, the typical solder bumpinterconnection 100 has several inherent weaknesses. During reflow, thesolder bump 104 will collapse and become barrel-shaped uponsolidification. This limits the height and pitch of solder joints andapplications of the solder bump interconnection 100 in high-densityminiaturized packages. Further, truncated spherical ends 108 of thesolder bump 104 are the main load bearing points and high stressconcentrations occur at these spherical ends 108. UBM 102 interacts withthe solder bump 104 and weakens the solder joints. Embrittlement at theIMC-solder interfaces 110 and coefficient of thermal expansion (CTE)mismatch in these IMC-solder interfaces 110 creates node for crackinitiation and propagation.

Unlike solder bump, copper (Cu) pillar does not collapse during reflowsoldering. Pillars can be packed closer together, increasing theinterconnection density. If plating is done directly on the chip metalpads, intermetallic compound (IMC) formation on the chip interface isavoided. The concern of solder diffusion and interaction with the thinfilms on the chip is also eliminated. In addition, failure is unlikelyto happen on the chip interface since Cu mechanical properties are muchbetter than solder. The pillar structure can also be engineered suchthat stress concentration and shear strain on solder is reduced.

FIGS. 2 a and 2 b show a schematic drawing of a conventional pillarinterconnect design 200 with a larger and a smaller pillar diameterrespectively. A key issue of the conventional pillar interconnect design200 is that the solder volume 204 and its wetting surface 206 vary asthe diameter of the pillar 202 changes. The pillar 202 with a smallerdiameter, as shown in FIG. 2 b, increases compliance as compared to thepillar 202 with a larger diameter, as shown in FIG. 2 a. However, thewetting surface 206 decreases when the diameter of the pillar 202becomes smaller. A decrease in the wetting surface 206 may affect jointreliability. In addition, solder bumping cannot be done on a device withvarying pillar diameters as this will result in non-planarity.

Hence, there is a need to provide an alternative interconnect structure,and method which seek to address at least one of the above-mentionedproblems.

SUMMARY

In accordance with a first aspect of the present invention, there isprovided an interconnect structure comprising: a base portion formed ona mounting surface of a first component; a pillar portion extending fromthe base portion and substantially perpendicularly to the mountingsurface; and a head portion formed on the pillar portion and havinglarger lateral dimensions than the pillar portion; wherein the baseportion and the pillar portion are integrally formed of a homogeneousmaterial.

The base portion may have larger lateral dimensions than the pillarportion.

The base portion, the pillar portion and the head portion may beintegrally formed of the homogeneous material.

The interconnect structure may further comprise an intermediate layerformed between the head portion and the pillar portion, the intermediatelayer comprising materials other than the homogenous material.

The intermediate layer may comprise TiW and Cu, Ti and Cu, or Cr and Cu.

The base portion may be formed on a contact layer formed on the mountingsurface of the first component.

The contact layer may comprise TiW and Cu, Ti and Cu, or Cr and Cu

The homogenous material may comprise a metal or a conducting materialsuitable for electroplating.

The metal may comprise one or more of a group consisting of Cu, Ni, andAu.

The pillar portion and the head portion may have a same cross sectionalshape.

The pillar portion and the head portion may have a different crosssectional shape.

The pillar portion and the base portion may have a same cross sectionalshape.

The pillar portion and the base portion may have a different crosssectional shape.

The head portion and the base portion may have a same cross sectionalshape.

The head portion and the base portion may have a different crosssectional shape.

The head portion may have a surface disposed for facing a secondcomponent to which the first component is to be mounted.

The surface may be convex.

The surface may be planar.

A dielectric or passivation layer may be deposited on the firstcomponent and such that the pillar portion and the base portion areeither encapsulated or remain exposed.

At least one of the base portion, the pillar portion and the headportion may be uniformly coated or selectively coated with one or moreselected from a group consisting of a wetting layer, a diffusion barrierlayer and a oxidation resistant layer.

In accordance with a second aspect of the present invention, there isprovided an interconnect structure for interconnecting first and secondcomponents, the interconnect structure comprising: a base portion formedon a mounting surface of the first component; a pillar portion extendingfrom the base portion and substantially perpendicularly to the mountingsurface; and a head portion formed on the pillar portion and havinglarger lateral dimensions than the pillar portion; a contact pad formedon a mounting surface of the second component; and a connection forconnecting the head portion of the interconnect structure to the contactpad; wherein the base portion and the pillar portion are integrallyformed of a homogeneous material.

The connection for connecting the head portion of the interconnectstructure to the contact pad may comprise one or more of a groupconsisting of solder, adhesive bonding, surface activated bonding,compression bonding and diffusion bonding.

A solder bump may be formed between facing surfaces of the head portionand the contact pad respectively.

The head portion and the contact pad may be substantially encapsulatedby solder.

In accordance with a third aspect of the present invention, there isprovided an interconnect structure for interconnecting a multiplecomponent stack and a substrate, the interconnect structure comprising:a first base portion formed on a first mounting surface of a firstcomponent of the stack; a first pillar portion extending from the firstbase portion and substantially perpendicularly to the first mountingsurface; and a second head portion formed on the second pillar portionand having larger lateral dimensions than the second pillar portion; asecond base portion formed on a second mounting surface of a secondcomponent of the stack; a second pillar portion extending from thesecond base portion and substantially perpendicularly to the secondmounting surface; and a second head portion formed on the second pillarportion and having larger lateral dimensions than the second pillarportion; a first and a second contact pad formed on a mounting surfaceof the substrate; and a connection for connecting the head portions tothe respective contact pads respectively; wherein the base portions andthe pillar portions are integrally formed of a homogeneous materialpillar and the first pillar portion is higher than the second pillarportion.

The interconnect structure may further comprise a spacer disposedbetween the first and second components of the stack.

The connection for connecting the head portion of the interconnectstructure to the contact pad may comprise one or more of a groupconsisting of solder, adhesive bonding, surface activated bonding,compression bonding and diffusion bonding.

In accordance with a fourth aspect of the present invention, there isprovided a method of fabricating an interconnect structure, the methodcomprising: forming a base portion on a mounting surface of a firstcomponent; forming a pillar portion, the pillar portion extending fromthe base portion and substantially perpendicularly to the mountingsurface; and forming a head portion on the pillar portion, the headportion having larger lateral dimensions than the pillar portion; andintegrally forming the base portion and the pillar portion with ahomogeneous material.

The method may further comprise forming the pillar portion and the headportion using different masks in a photolithography process.

The step of forming the pillar portion and the head portion may comprisean imprinting process

A mould for the imprinting process may be patterned and may comprisepolymer, composite or metal materials.

The method may further comprise forming an intermediate layer betweenthe head portion and the pillar portion.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the invention will be better understood and readilyapparent to one of ordinary skill in the art from the following writtendescription, by way of example only, and in conjunction with thedrawings, in which:

FIG. 1 shows a schematic drawing of a typical solder bumpinterconnection.

FIGS. 2 a and 2 b show a schematic drawing of a conventional pillarinterconnect design with a larger and a smaller pillar diameterrespectively.

FIG. 3 a shows a schematic drawing of an assembly of a micro device chipand a substrate, which are connected by a pin-head interconnectstructure and a solder bump, according to an example embodiment.

FIG. 3 b shows a schematic drawing of the assembly with a pin-headinterconnect structure having a smaller diameter as compared to thatshown in FIG. 3 a.

FIG. 4 a shows a schematic drawing of the pin-head interconnect of FIG.3.

FIGS. 4 b and 4 c show schematic drawings of variations of the pin-headinterconnect of FIG. 4 a.

FIG. 4 d shows a schematic drawing of a variation of the pin-headinterconnect of FIG. 4 b.

FIGS. 4 e to 4 g show top sectional views of the pin-head interconnecthaving different designs of horizontal portions.

FIGS. 5 a to 5 j show a process flow for fabricating a pin-headinterconnect using photolithography-plating, according to an exampleembodiment.

FIGS. 6 a to 6 g show a continuation of a process for fabricating thepin-head interconnect using photolithography-plating from FIG. 5 e.

FIGS. 7 a to 7 g show an alternative continuation of a process forfabricating the pin-head interconnect using photolithography-platingfrom FIG. 5 e.

FIGS. 8 a to 8 j shows a process flow for fabrication of a pin-headinterconnect using low cost imprinting-plating process, according to anexample embodiment.

FIG. 9 a show a schematic drawing of pin-head interconnects connected toa micro device.

FIG. 9 b show a schematic drawing of planarized pin-head interconnectsconnected to the micro device.

FIGS. 10 a to 10 c show schematic drawings of one micro deviceinterconnected to a substrate using different interconnect structuresembodying the present invention.

FIGS. 11 a and 11 b show schematic drawings of two micro devicesinterconnected to the substrate using different interconnect structuresembodying the present invention.

DETAILED DESCRIPTION

The embodiments described herein provide an interconnect structure toovercome the inherent weaknesses in solder bump interconnection. Theembodiments also provide an improved interconnect structure to overcomethe current limitations that metal interconnects and solder bumps havein micro devices packaging or integration.

FIG. 3 a shows a schematic drawing of an assembly 300 of a micro devicechip 302 and a substrate 304, which are connected by a pin-headinterconnect structure 306 and a solder bump 308. A base material of themicro device chip 302 can be, for example but not limited to,semiconductor materials such as silicon, ceramic, glass or polymermaterials, or the like. The base material of the micro device chip 302can be passivated with dielectric materials, metallized, patterned andcircuited with channels, metal traces and pads, The pin-headinterconnect 306 comprises a substantially vertical pillar portion 310and a substantially horizontal head portion 312. The head portion 312 isdisposed at one end of the pillar portion 310. The other end of thepillar portion 310 of the pin-head interconnect 306, i.e. the endopposite that having the head portion 312, is in contact with a microdevice chip 302. The solder bump 308 is deposited between the headportion 312 and a metal pad 314 of a substrate 304. The pillar portion310 and the head portion 312 of the pin-head interconnect 306 are madeof a homogeneous metal. One example of the homogeneous metal is copper.It is preferred that the solder bump 308 is lead-free. The substrate 304can be made of any polymer, composite or inorganic materials such aspolyimide, glass-epoxy, ceramic or silicon etc. It will be appreciatedby a person skilled in the art that other materials can be used for themicro device chip 302, the pin-head interconnect 306, the solder bump308 and the substrate 304 in other embodiments.

FIG. 3 b shows a schematic drawing of the assembly 300 with a pillarportion 310 of a pin-head interconnect 306 having a smaller width 316 ascompared to that of FIG. 3 a. By comparing FIGS. 3 a and 3 b, it can beobserved that the size of the solder bump 308 does not change when thewidth 316 of the pillar portion 310 of the pin-head interconnect 306decreases. Further, the assembly 300 advantageously allows a variationof a width to height aspect ratio of the pillar portion 310 of thepin-head interconnect 306 to increase compliance of the assembly 300,without changing the solder bump size. This advantageously reduces thelocal shear strain on the interconnection due to coefficient of thermalexpansion (CTE) mismatch between the micro device chip 302 and thesubstrate 304. The pin-head interconnect 306 advantageously allowsstandard solder pads and solder bumps to be used on the micro devicechip 302 even if the widths 316 of the pillar portions 310 of thepin-head interconnects 306 across the micro device chip 302 are variedto give an optimal compliance at different locations of the micro devicechip 302.

FIG. 4 a shows a schematic drawing of the pin-head interconnect 302 ofFIG. 3. The pin-head interconnect 302 comprises a substantially roundpillar portion 306. The pin-head interconnect 302 further comprises ahead portion 308 and a substantially horizontal base portion 402. Thehead portion 308 and the base portion 402 are disposed at respectiveends of the pillar portion 306. FIG. 4 b shows a schematic drawing of avariation of the pin-head interconnect 302 of FIG. 4 a. In thisembodiment, the pin-head interconnect 302 has a substantiallyrectangular vertical portion 306.

In the embodiments of FIGS. 4 a and 4 b, the head portion 308 and thebase portion 402 of the pin-head interconnect 302 have larger lateraldimensions than the pillar portion 306. The head portion 308 and thebase portion 402 have a same cross-sectional shape. The pillar portion306 has a different cross-sectional shape as compared to those of thehead portion 308 and the base portion 402.

FIG. 4 c shows a schematic drawing of a variation of the pin-headinterconnect 302 of FIG. 4 a. FIG. 4 d shows a schematic drawing of avariation of the pin-head interconnect 302 of FIG. 4 b. In theembodiments of FIGS. 4 c and 4 d, the pin-head interconnect 302 can beconsidered to include a base portion 402 having same lateral dimensionsand cross-sectional shape as the pillar portion 306. The head portion308 has larger lateral dimensions than the pillar portion 306 and thebase portion 402. The head portion 308 has a different cross-sectionalshape as compared to those of the pillar portion 306 and the baseportion 402.

FIG. 4 e shows a top sectional view of the pin-head interconnect 302having a substantially round pillar portion 306 and a substantiallyround base portion 402 and a substantially round head portion 308. FIGS.4 f and 4 g show top sectional views of the pin-head interconnect 302with a round pillar portion 306 and a round base portion 402 butdifferent designs of the head portion 308. In FIG. 4 f, the head portion308 comprises two semi-circular elements 404. The semi-circular elements404 are spaced apart and are arranged such that the respective straightedges 406 face each other and are aligned from one end to the other end.In FIG. 4 g, the head portion 308 is substantially cross shaped. InFIGS. 4 e, 4 f and 4 g, the pillar portion 306 is disposed substantiallyin the centre of the head portion 308.

In the embodiments of FIGS. 4 e, 4 f and 4 g, the pillar portion 306 hasthe same lateral dimensions and cross-sectional shape as the baseportion 402. The head portion 308 has larger lateral dimensions than thepillar portion 306 and the base portion 402. The head portion 308 has adifferent cross-sectional shape as compared to those of the pillarportion 306 and the base portion 402. As appreciated by a person skilledin the art, the designs of the pillar portions 306, the head portions308 and the base portions 402 of the pin-head interconnect 302 are notrestricted to the examples as described above.

Two example methods, namely photolithography-plating andimprinting-plating, that can be used for manufacturing pin-headinterconnects will now be described. FIGS. 5 a to 5 j show a processflow for fabricating a pin-head interconnect usingphotolithography-plating. FIG. 5 a shows a schematic diagram of amounting surface in the form of an adhesion and seed layer 502 isdeposited on a silicon (Si) chip 504. In this embodiment, the adhesionlayer is about 100 to about 1000 angstrom and the seed layer is about1000 to about 5000 angstrom. Titanium-tungsten (TiW) and copper (Cu) areused for the adhesion and seed layer 502. Depending on the base materialof the chip, Ti and Cu or chromium (Cr) and Cu can also be used for theadhesion and seed layer 502 in other embodiments. A first photoresist(PR1) layer 506 is deposited on the adhesion and seed layer 502. A maskwith a pattern (not shown) is placed above the PR1 layer 506. After thePR1 layer 506 is exposed to ultraviolet (UV) light through the patternedmask, a patterned opening 508 is formed as shown in FIG. 5 b. A copperlayer 510 is deposited in the opening 508 by e.g. electroplating, whichis shown in FIG. 5 c. In this embodiment, the thickness of the copperlayer 510 is about 1.0 to about 10 micron.

The process of forming the copper layer 510 illustrated in FIGS. 5 a to5 c is comparable to a process of forming a conventional chip pad. Thecopper chip pad 510 forms a base portion of a pin-head interconnect.This advantageously allows the pin-head interconnect to be plateddirectly on the copper chip pad. This advantageously provides an ease ofintegration of manufacturing an array of pin-head interconnects at awafer level.

FIG. 5 d shows a schematic diagram of a second photoresist (PR2) layer512 deposited on the PR1 layer 506 with an opening 514 formed. Theopening 514 is formed in the PR2 layer 512 with conventionalphotolithography processes. A copper layer 516 is deposited in theopening 514 by e.g. electroplating, as shown in FIG. 5 e. The copperlayer 516 forms a pillar portion of a pin-head interconnect. The heightto diameter aspect ratio of the pillar portion is preferably about 0.5to about 4.0. A copper layer 518 having a convex surface is deposited inthe opening 514 by e.g. electroplating, as shown in FIG. 5 f. The convexcopper layer 518 is formed due to isotropic copper ion deposition on thepillar portion 516 above the PR2 layer 512. The convex copper layer 518forms a head portion of a pin-head interconnect. FIG. 5 g shows that aconvex pin-head interconnect 520 made of Cu is formed afterelectroplating. The PR1 layer 506 and PR2 layer 512 are removed. FIG. 5h shows that portions of the adhesion and seed layer 502 which extendbeyond the copper layer 510 are removed. FIG. 5 i shows that adielectric or passivation layer 522 is deposited on the silicon chip504. Benzocyclobutene (BCB) can be used for the dielectric orpassivation layer 522 in this embodiment. The dielectric or passivationlayer 522 encapsulates the base portion and part of the pillar portionof the pin-head interconnect 520. FIG. 5 j shows that portions of thedielectric or passivation layer 522 are removed. The dielectric orpassivation layer 522 encapsulating the base portion and part of thepillar portion of the pin-head interconnect 520 can be removed by usingconventional photolithography processes if a photoimageable layer 522 isused in this embodiment.

In other embodiments, it is possible to end the process of manufacturingthe pin-head interconnect at FIG. 5 i. The step of removing someportions of the dielectric or passivation layer 522 can producemetal-pad-defined interconnect structures.

Alternatively, after the copper layer 516 is deposited in the gap 514 asshown in FIG. 5 e, a third photoresist (PR3) layer 602 can be depositedon the PR2 layer 512 (as shown in FIG. 6 a) or an adhesion and seedlayer 702 can be deposited on the PR2 layer 512 (as shown in FIG. 7 a).

With reference to FIG. 6 a, a third photoresist (PR3) layer 602 isdeposited on the PR2 layer 512, an opening 604 is formed in the PR3layer 602 with conventional photolithography processes. A copper layer606 having a convex surface is deposited in the opening 604 by e.g.electroplating, as shown in FIG. 6 b. The convex surface of the copperlayer 606 is formed due to isotropic copper ion deposition. The PR3layer 602 serves to constrain and define the formation and growth of theconvex copper layer 606 according to the patterned opening 604. Thecopper layer 606 forms a head portion of a pin-head interconnect. Thecopper layer 606 can be planarized to produce a flat pin-head usingchemical, mechanical or chemical-mechanical means before PR3 layer 602is removed.

FIG. 6 c shows that a pin-head interconnect 608 made of Cu with aplanarized copper layer 606 after planarization. FIG. 6 d shows that thePR1 layer 506, the PR2 layer 512 and the PR3 layer 602 are removed. FIG.6 e shows that portions of the adhesion and seed layer 502 which extendbeyond the copper layer 510 are removed. FIG. 6 f shows a dielectric orpassivation layer 610 deposited on the silicon chip 504. In thisembodiment, benzocyclobutene (BCB) is used for the dielectric orpassivation layer 610. The dielectric or passivation layer 610encapsulates the base portion and part of the pillar portion of thepin-head interconnect 608. FIG. 6 g shows that portions of thedielectric or passivation layer 610 encapsulating the base portion andpart of the pillar portion of the pin-head interconnect 608 are removed.The dielectric or passivation layer 610 can be removed by usingconventional photolithography processes if a photoimageable layer 610 isused in this embodiment.

In other embodiments, it is possible to end the process of manufacturingthe pin-head interconnect at FIG. 6 f. The step of removing someportions of the dielectric or passivation layer 610 can producemetal-pad-defined interconnect structures.

With reference to FIG. 7 a, where an adhesion and seed layer 702 isdeposited on the PR2 layer 512, a third photoresist (PR3) layer 704 isdeposited on the layer 702. Titanium-tungsten (TiW) and copper (Cu) areused for the adhesion and seed layer 702. Depending on the base materialof the chip, Ti and Cu or chromium (Cr) and Cu can also be used for theadhesion and seed layer 702 in other embodiments. An opening 706 isformed in the PR3 layer 704, as shown in FIG. 7 b, with conventionalphotolithography processes. A copper layer 708 having a substantiallyplanar surface is deposited in the opening 706, as shown in FIG. 7 c.FIG. 7 d shows that the PR1 layer 506, the PR2 layer 512 and the PR3layer 704 are removed. The portions of the adhesion and seed layer 702which extend beyond the copper layer 708 are removed. The adhesion andseed layer 702 and the copper layer 708 form a head portion 710 of apin-head interconnect. FIG. 7 e shows that portions of the adhesion andseed layer 502 which extend beyond the copper layer 510 are removed. Apin-head interconnect 712 made of Cu is formed. FIG. 7 f shows adielectric or passivation layer 714 deposited on the silicon chip 504.In this embodiment, benzocyclobutene (BCB) is used for the dielectric orpassivation layer 714. The dielectric or passivation layer 714encapsulates the base portion and part of the pillar portion of thepin-head interconnect 712. FIG. 7 g shows that portions of thedielectric or passivation layer 714 encapsulating the base portion andpart of the pillar portion of the pin-head interconnect 712 are removed.The dielectric or passivation layer 714 can be removed by usingconventional photolithography processes if a photoimageable layer 714 isused in this embodiment.

In other embodiments, it is possible to end the process of manufacturingthe pin-head interconnect at FIG. 7 f. The step of removing someportions of the dielectric or passivation layer 714 can producemetal-pad-defined interconnect structures.

FIGS. 8 a to 8 j shows a process flow for fabrication a pin-headinterconnect using low cost imprinting-plating process. FIG. 8 a shows aschematic diagram of a mounting surface in the form of an adhesion andseed layer 802 deposited on a silicon (Si) chip 804. Titanium-tungsten(TiW) and copper (Cu) are used for the adhesion and seed layer 802.Depending on the base material of the chip, Ti and Cu or chromium (Cr)and Cu can also be used for the adhesion and seed layer 802 in otherembodiments. A first photoresist (PR1) layer 806 is deposited on theadhesion and seed layer 804. An opening 808 is formed in the PR1 layer806, as shown in FIG. 8 b, with conventional photolithography processes.Alternatively, the PR1 layer 806 can be a non photosensitive polymerresist which is imprinted with a patterned mould and plasma ashed toproduce the opening 808. A copper layer 810 is deposited in the opening808 by e.g. electroplating, which is shown in FIG. 8 c.

The process of forming the copper layer 810 illustrated in FIGS. 8 a to8 c is comparable to a process of forming a conventional chip pad. Thecopper chip pad 810 forms a base portion of a pin-head interconnect.This advantageously allows the pin-head interconnect to be plateddirectly on the copper chip pad. This advantageously provides an ease ofintegration of the manufacturing an array of pin-head interconnects at awafer level.

FIG. 8 d shows a schematic diagram of a second polymer resist (PR2)layer 812 deposited on the PR1 layer 806. An imprinting mould 814 isused to form a cavity 816 in the PR2 layer 812, as shown in FIG. 8 e.The imprinting mould 814 is made of nickel in this embodiment. Otherpolymer, composite or metal materials can be used to fabricate the mould814 in different embodiments. The residues of the PR2 layer 812 at thebottom of the cavity 816 can be removed by plasma ashing followed by wetchemical cleaning. The mould imprinting process enables high aspectratio openings to be formed on a thick polymer resist. As shown in FIG.8 e, a cavity with a complex geometry can be formed in one imprintingstep. Copper is deposited into the cavity 816 by e.g. electroplating andthe copper layer 818 has a convex pin-head surface, as shown in FIG. 8f. The convex surface of the copper layer 818 is formed due to isotropiccopper ion deposition. In this embodiment, the copper layer 818 forms apillar portion and a head portion of a pin-head interconnect. The convexpin-head can be planarized using chemical, mechanical orchemical-mechanical planarizing processes before the removal of the PR2layer 812 in other embodiments.

FIG. 8 g shows that a pin-head interconnect 820 made of Cu is formed.The PR1 layer 806 and the PR2 layer 812 are removed. FIG. 8 h shows thatportions of the adhesion and seed layer 802 which extend beyond thecopper layer 810 are removed. FIG. 8 i shows a dielectric or passivationlayer 822 deposited on the silicon chip 804. In this embodiment,benzocyclobutene (BCB) is used for the dielectric or passivation layer822. The dielectric or passivation layer 822 encapsulates the baseportion and part of the pillar portion of the pin-head interconnect 820.FIG. 8 j shows that portions of the dielectric or passivation layer 822encapsulating the base portion and part of the pillar portion of thepin-head interconnect 820 are removed. The dielectric or passivationlayer 822 can be removed by using conventional photolithographyprocesses if a photoimageable layer 822 is used in this embodiment.

In other embodiments, it is possible to end the process of manufacturingthe pin-head interconnect at FIG. 8 i. The step of removing someportions of the dielectric or passivation layer 822 can producemetal-pad-defined interconnect structures.

In the above described photolithography-plating and imprinting-platingprocesses, the formation of the pin-head interconnect can be viewed asthe formation of a modified chip interconnect structure. Further, partsincluding the base portion, the pillar portion and the head portion ofthe interconnect structures can be uniformly or selectively treated orcoated to enhance their wetting, diffusion and oxidation resistantbehaviour. Nickel, for example, is commonly used as a diffusion barrierlayer and gold as an oxidation resistant layer. These metals can bedeposited on the interconnect structures by sputtering or electroplatingprocesses. The pin-head interconnect structures can be advantageouslyfabricated at the wafer level. The micro devices can be assembled on asubstrate with or without underfill encapsulation.

Further, copper is used to form the base portions and the pillarportions of the pin-head interconnects described above. In otherembodiments, nickel or gold can be used for forming the base portion andthe pillar portion. In such embodiments, the adhesion and seed layer maycomprise nickel or gold.

In the above described photolithography-plating and imprinting-platingprocesses, the pin-head interconnects are first formed on the siliconchip and substrates are then brought into contact with the pin-headinterconnects. In other embodiments, the pin-head interconnects can befirst formed on the substrates and the silicon chips are then broughtinto contact with the pin-head interconnects.

FIG. 9 a show a schematic drawing of pin-head interconnects 902connected to a micro device 904. The micro device 904 can be any deviceswith electronic, optic, fluidic or micro-electro-mechanical functions ora combination of these functions. The pin-head interconnects 902comprise a base portion 906, a pillar portion 908 and a head portion910. The base portion 906 and the head portion 910 are disposed atrespective ends of the pillar portion 908. A passivation layer 914 ofthe micro device 904 can be of photoimageable or non-photoimageablematerial.

In this embodiment, the base portion 906 and the head portion 910 havelarger lateral dimensions than the pillar portion 906. The head portion910 has larger lateral dimensions than the base portion 906. The baseportion 906, the pillar portion 908 and the head portion 910 havedifferent cross-sectional areas. The base portion 906 surface issubstantially planar and the head portion 910 has a curved surface.

FIG. 9 b show a schematic drawing of another example of pin-headinterconnects 902 of FIG. 9 a connected to the micro device 904. Thehead portion 912 of the pin-head interconnects 902 have a substantiallyplanar surface.

FIGS. 10 a, 10 b and 10 c show schematic drawings of one micro device904 interconnected to a substrate 10. In FIG. 10 a, the pin-headinterconnects 902 of FIG. 9 b are connected to metal pads 1002 of asubstrate 1004 using methods, e.g. solder, adhesive bonding, indirectbonding or direct bonding. In FIG. 10 b, the pin-head interconnects 902of FIG. 9 b are connected to the metal pads 1002 of the substrate 1004using solder bumps 1006. The solder bumps 1006 can be preformed oneither the pin-head interconnects 902 or the metal pads 1002 before thepin-head interconnects 902 and the substrate 1004 are brought together.In FIG. 10 c, the pin-head interconnects 902 of FIG. 9 b are connectedto the embedded metal pads 1002 of the substrate 1004 by solders 1008 orother attachment methods like adhesive bonding, surface activatedbonding, compression bonding or diffusion bonding. The embedded metalpads 1002 are formed within the cavities of the substrate 1012. The headportions 912 of the pin-head interconnects 902 are fully encapsulated bysolders 1008. Alternatively, the horizontal portions 912 of the pin-headinterconnects 902 can be partially encapsulated by the solders 1008.

The pin-head interconnects can be used for joining, interconnecting orsupporting micro devices 904 for purposes of packaging and integration.FIGS. 11 a and 11 b show schematic drawings of two micro devices 904interconnected to the substrate 1004. In FIG. 11 a, the pin-headinterconnects 902 are connected to the metal pads 1002 of the substrate1004 using methods, e.g. solder, adhesive, surface activated,compression or diffusion bonding. In FIG. 11 b, the pin-headinterconnects 902 are connected to the metal pads 1002 of the substrate1004 using solder bumps 1006. A spacer 1102 is disposed between themicro devices 904 in the embodiments. In other embodiments, more thantwo micro devices 904 can be interconnected to the substrate 1004.

With the pin-head interconnect design in the example embodiments, the Cupin-head interconnect can advantageously be plated directly on a Cumetallized chip pad. Hence, UBM is no longer necessary on a chip pad.Designing and optimizing the interconnect reliability on the substrateside is less complex because the concern of thin film materials andactive device interaction exist only on the chip side.

High current, coupled with the need to reduce the package size, lead tohigh heat generation within the package. The ability to design andstructure Cu interconnect for specific locations on the same chip canadvantageously enhance thermal performance significantly. As a chip sizegets smaller and denser, high temperature and current density promoteelectromigration is a growing concern. Since the melting point of Cu is1083° C., which is much higher in comparison to the melting point ofmost leaded or lead-free solder materials, the atomic diffusion of a Cupin-head interconnect is advantageously much slower than most soldermaterials. Hence, electromigration is advantageously reduced in the Cupin-head interconnect.

It will be appreciated by a person skilled in the art that numerousvariations and/or modifications may be made to the present invention asshown in the specific embodiments without departing from the spirit orscope of the invention as broadly described. The present embodimentsare, therefore, to be considered in all respects to be illustrative andnot restrictive.

For example, it will be appreciated that in different embodiments, thebase of the pillar structure is formed on a surface of the substrate,for connection of the pillar head to the chip. More generally, theinterconnect structure can be applied between mounting surfaces of twocomponents or elements to be interconnected, or between multi componentstacks and a substrate, in different embodiments.

Furthermore, the homogenous material for the interconnect structure maycomprise any metal or any conducting material suitable forelectroplating, in different embodiments.

Furthermore, in other embodiments, the interconnect structure can beformed on any surface that can be subjected to electroplating forformation of the interconnect structure. Also, if the interconnectstructure is to be formed on surfaces that cannot be subjected toelectroplating, a seed plating layer may be deposited. An additionaladhesion layer may be required if the seed layer cannot adhere directlyto the base material of the surface.

In various embodiments, the interconnect structure can be fabricated byother electroplated metals like nickel or gold. The adhesion layer canbe TiW, Ti or Cr and the seed layer for plating can be nickel or gold ifa silicon, glass or ceramic substrate is used. For other materials likeepoxy-glass fibre base, the seed or plating layer can be laminated onthe base material.

1. A micro device interconnect structure comprising: a base portionformed on a mounting surface of a first component; a pillar portionhaving smaller lateral dimensions than the base portion extending fromthe base portion and substantially perpendicularly to the mountingsurface; and a head portion formed on the pillar portion and havinglarger lateral dimensions than the pillar portion; wherein the baseportion, the pillar portion and the head portion are integrally formedof a homogeneous material.
 2. The interconnect structure of claim 1,further comprising an intermediate layer formed between the head portionand the pillar portion, the intermediate layer comprising materialsother than the homogenous material.
 3. The interconnect structure ofclaim 2, wherein the intermediate layer comprises TiW and Cu, Ti and Cu,or Cr and Cu.
 4. The interconnect structure of claim 1, wherein the baseportion is formed on a contact layer formed on the mounting surface ofthe first component.
 5. The interconnect structure of claim 4, whereinthe contact layer comprises TiW and Cu, Ti and Cu, or Cr and Cu.
 6. Theinterconnect structure of claim 1, wherein the homogenous materialcomprises a metal or a conducting material suitable for electroplating.7. The interconnect structure of claim 6, wherein the metal comprisesone or more of a group consisting of Cu, Ni, and Au.
 8. The interconnectstructure of claim 1, wherein the pillar portion and the head portionhave a same cross sectional shape.
 9. The interconnect structure ofclaim 1, wherein the pillar portion and the head portion have adifferent cross sectional shape.
 10. The interconnect structure of claim1, wherein the pillar portion and the base portion have a same crosssectional shape.
 11. The interconnect structure of claim 1, wherein thepillar portion and the base portion have a different cross sectionalshape.
 12. The interconnect structure of claim 1, wherein the headportion and the base portion have a same cross sectional shape.
 13. Theinterconnect structure of claim 1, wherein the head portion and the baseportion have a different cross sectional shape.
 14. The interconnectstructure of claim 1, wherein the head portion has a surface disposedfor facing a second component to which the first component is to bemounted.
 15. The interconnect structure of claim 14, wherein the surfaceis convex.
 16. The interconnect structure of claim 14, wherein thesurface is planar.
 17. The interconnect structure of claim 1, wherein adielectric or passivation layer is deposited on the first component andsuch that the pillar portion and the base portion are eitherencapsulated or remain exposed.
 18. The interconnect structure of claim1, wherein at least one of the base portion, the pillar portion and thehead portion are uniformly coated or selectively coated with one or moreselected from a group consisting of a wetting layer, a diffusion barrierlayer and an oxidation resistant layer.
 19. A micro device interconnectstructure for interconnecting first and second components, theinterconnect structure comprising: a base portion formed on a mountingsurface of the first component; a pillar portion having smaller lateraldimensions than the base portion extending from the base portion andsubstantially perpendicularly to the mounting surface; a head portionformed on the pillar portion and having larger lateral dimensions thanthe pillar portion; a contact pad formed on a mounting surface of thesecond component; and a connection for connecting the head portion ofthe interconnect structure to the contact pad; wherein the base portion,the pillar portion and the head portion are integrally formed of ahomogeneous material.
 20. The interconnect structure of claim 19,wherein the connection for connecting the head portion of theinterconnect structure to the contact pad comprises one or more of agroup consisting of solder, adhesive bonding, surface activated bonding,compression bonding and diffusion bonding.
 21. The interconnectstructure of claim 19, wherein a solder bump is formed between facingsurfaces of the head portion and the contact pad respectively.
 22. Theinterconnect structure of claim 19, wherein the head portion and thecontact pad are substantially encapsulated by solder.
 23. A micro deviceinterconnect structure for interconnecting a multiple component stackand a substrate, the interconnect structure comprising: a first baseportion formed on a first mounting surface of a first component of thestack; a first pillar portion extending from the first base portion andsubstantially perpendicularly to the first mounting surface; and a firsthead portion formed on the first pillar portion and having largerlateral dimensions than the first pillar portion; a second base portionformed on a second mounting surface of a second component of the stack;a second pillar portion extending from the second base portion andsubstantially perpendicularly to the second mounting surface; and asecond head portion formed on the second pillar portion and havinglarger lateral dimensions than the second pillar portion; a first and asecond contact pad formed on a mounting surface of the substrate; and aconnection for connecting the first and second head portions to thefirst and second contact pads respectively; wherein the base portionsand the pillar portions are integrally formed of a homogeneous materialpillar and the first pillar portion is higher than the second pillarportion.
 24. The interconnect structure of claim 23, further comprisinga spacer disposed between the first and second components of the stack.25. The interconnect structure of claim 23, wherein the connection forconnecting the head portion of the interconnect structure to the contactpad comprises one or more of a group consisting of solder, adhesivebonding, surface activated bonding, compression bonding and diffusionbonding.
 26. A method of fabricating a micro device interconnectstructure, the method comprising: forming a base portion on a mountingsurface of a first component; forming a pillar portion having smallerlateral dimensions than the base portion, the pillar portion extendingfrom the base portion and substantially perpendicularly to the mountingsurface; forming a head portion on the pillar portion, the head portionhaving larger lateral dimensions than the pillar portion; and integrallyforming the base portion, the pillar portion, and the head portion witha homogeneous material.
 27. The method of claim 26, further comprisingforming the pillar portion and the head portion using different masks ina photolithography process.
 28. The method of claim 26, wherein the stepof forming the pillar portion and the head portion comprises animprinting process.
 29. The method of claim 28, wherein a mould for theimprinting process is patterned and comprises polymer, composite ormetal materials.
 30. The method of claims 26, 27, 28, or 29, furthercomprising forming an intermediate layer between the head portion andthe pillar portion.